Category:Thin film devices: Difference between revisions
From ETHW
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
[[Image:Thin Film Devices Substrate Heating Unit with Thin Film of inconel.jpg|thumb|right|A NASA substrate heating unit covered with a thin film of a nickel-chromium-based superalloy ]] | [[Image:Thin Film Devices Substrate Heating Unit with Thin Film of inconel.jpg|thumb|right|A NASA substrate heating unit covered with a thin film of a nickel-chromium-based superalloy ]] | ||
Devices which use layers of material ranging from a nanometer to several micrometers in thickness, used often in semiconductors and optical coatings | |||
[[Category:Electron_devices|{{PAGENAME}}]] | [[Category:Electron_devices|{{PAGENAME}}]] | ||
Latest revision as of 20:56, 18 January 2013
Devices which use layers of material ranging from a nanometer to several micrometers in thickness, used often in semiconductors and optical coatings
Pages in category "Thin film devices"
The following 3 pages are in this category, out of 3 total.
Media in category "Thin film devices"
This category contains only the following file.
