First-Hand:Start of epitaxial growth at Texas Instruments: Difference between revisions
(The first work at Texas Instruments on silicon epitaxial R and D.) |
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== A beginning of Epitaxial Growth R and D at Texas Instruments == | == A beginning of Epitaxial Growth R and D at Texas Instruments == | ||
In the summer of 1960 I worked for Walter Runyan. Walt came in one day, while I was working on Si solar cell calibration and some photovoltaic devices as I recall, asked me to look into epitaxial growth.Ok. Three weeks later, Walt asked me what I was doing on silicon epy. Where is it being done and how do you spell it? Its on the back dock (of the new Material's Building). I went out later and found it in a converted broom closet. Walt asked me somewhat later if I had found the reactor. "Yes", I said, "but it can't be important; it is in a broom closet". "Jerry", he said, "you couldn't be more wrong". Our epi group later grew to 4 more engineers. I later had the second publication on the subject:<br> | In the summer of 1960 I worked for Walter Runyan. Walt came in one day, while I was working on Si solar cell calibration and some photovoltaic devices as I recall, asked me to look into epitaxial growth.Ok. Three weeks later, Walt asked me what I was doing on silicon epy. Where is it being done and how do you spell it? Its on the back dock (of the new Material's Building). I went out later and found it in a converted broom closet. Walt asked me somewhat later if I had found the reactor. "Yes", I said, "but it can't be important; it is in a broom closet". "Jerry", he said, "you couldn't be more wrong". Our epi group later grew to 4 more engineers. I later had the second publication on the subject:<br> | ||
<span style="font-size: 12pt; letter-spacing: -0.15pt;">1962<span style=""> </span>Kinetics of Silicon Crystal Growth from SiCl</span><sub><span style="font-size: 12pt; letter-spacing: -0.15pt;">4 </span></sub><span style="font-size: 12pt; letter-spacing: -0.15pt;">Deposition, Journal of The | <span style="font-size: 12pt; letter-spacing: -0.15pt;">1962<span style=""> </span>Kinetics of Silicon Crystal Growth from SiCl</span><sub><span style="font-size: 12pt; letter-spacing: -0.15pt;">4 </span></sub><span style="font-size: 12pt; letter-spacing: -0.15pt;">Deposition, Journal of The | ||
Electrochemical<span style=""> S</span>ociety, '''109,''' No. 12, December, 1962 pp1171-1175. And a chapter with Cameron Allen in an ASME conference book. | Electrochemical<span style=""> S</span>ociety, '''109,''' No. 12, December, 1962 pp1171-1175. And a chapter with Cameron Allen in an ASME conference book. </span> | ||
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Revision as of 15:57, 5 January 2009
A beginning of Epitaxial Growth R and D at Texas Instruments
In the summer of 1960 I worked for Walter Runyan. Walt came in one day, while I was working on Si solar cell calibration and some photovoltaic devices as I recall, asked me to look into epitaxial growth.Ok. Three weeks later, Walt asked me what I was doing on silicon epy. Where is it being done and how do you spell it? Its on the back dock (of the new Material's Building). I went out later and found it in a converted broom closet. Walt asked me somewhat later if I had found the reactor. "Yes", I said, "but it can't be important; it is in a broom closet". "Jerry", he said, "you couldn't be more wrong". Our epi group later grew to 4 more engineers. I later had the second publication on the subject:
1962 Kinetics of Silicon Crystal Growth from SiCl4 Deposition, Journal of The Electrochemical Society, 109, No. 12, December, 1962 pp1171-1175. And a chapter with Cameron Allen in an ASME conference book.