Andrew R. Neureuther: Difference between revisions
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Since joining the faculty of the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley in 1966, Andrew R. Neureuther has helped create the tools used by the semiconductor industry to miniaturize [[Transistors|transistors]]. From industrial experience with [[Frederick H. Dill|F.H. Dill]] and with colleague [[William G. Oldham|W.G. Oldham]], Dr. Neureuther developed pioneering, user-oriented computer programs for simulation and modeling of profiles in lithography and etching. His work has continually fueled the growth of the computer-aided design industry in areas such as optical aerial imaging, mask scattering, time-evolution topography and resist processing. His lithographic models reduce the complexity in the most intricate steps of the silicon manufacturing process. A [[IEEE Fellow Grade History|Fellow of the IEEE]], Dr. Neureuther is a member of the U.S. National Academy of Engineering. He is Conexant Systems Distinguished Professor in the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley. | Since joining the faculty of the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley in 1966, Andrew R. Neureuther has helped create the tools used by the semiconductor industry to miniaturize [[Transistors|transistors]]. From industrial experience with [[Frederick H. Dill|F.H. Dill]] and with colleague [[William G. Oldham|W.G. Oldham]], Dr. Neureuther developed pioneering, user-oriented computer programs for simulation and modeling of profiles in lithography and etching. His work has continually fueled the growth of the computer-aided design industry in areas such as optical aerial imaging, mask scattering, time-evolution topography and resist processing. His lithographic models reduce the complexity in the most intricate steps of the silicon manufacturing process. A [[IEEE Fellow Grade History|Fellow of the IEEE]], Dr. Neureuther is a member of the U.S. National Academy of Engineering. He is Conexant Systems Distinguished Professor in the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley. | ||
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[[Category:Components,_circuits,_devices_&_systems]] | [[Category:Components,_circuits,_devices_&_systems]] | ||
Revision as of 15:39, 22 July 2014
Biography
Since joining the faculty of the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley in 1966, Andrew R. Neureuther has helped create the tools used by the semiconductor industry to miniaturize transistors. From industrial experience with F.H. Dill and with colleague W.G. Oldham, Dr. Neureuther developed pioneering, user-oriented computer programs for simulation and modeling of profiles in lithography and etching. His work has continually fueled the growth of the computer-aided design industry in areas such as optical aerial imaging, mask scattering, time-evolution topography and resist processing. His lithographic models reduce the complexity in the most intricate steps of the silicon manufacturing process. A Fellow of the IEEE, Dr. Neureuther is a member of the U.S. National Academy of Engineering. He is Conexant Systems Distinguished Professor in the Electrical Engineering and Computer Sciences Department at the University of California at Berkeley.
